High-quality thin films – ultra-low pollution
High output, compact system design – low operating costs
High-speed substrate rack design (up to 1000 RPM) and equipped with accurate endpoint monitoring (SIMS).
Magnetoresistive random access memory (MRAM)
Dielectric thin film
Etching of III-V group optoelectronic materials
Spintronics
Metal electrodes and orbitals
superconductor
Laser end face coating
High reflectance (HR) film
Anti-reflective (AR) film
Ring laser gyroscope reflector
X-ray optical system
Infrared (IR) sensor
Group II-VI materials
Communication Filter
